Mavala PORE DETOX Perfecting Purifying Mask and similar items

Mavala PORE DETOX Purifying Mask will give you a beautiful refined skin texture and no shine in just 10 minutes! This caring partner for skin prone to imperfection and oiliness, unblocks and tightens pores without drying the skin. Formulated with 93% of natural origin ingredients, it is concentrated in Fleischer Willowherb, a rare persistent Alpine species rich in flavonoids (anti-inflammatory and antioxidant), PORE DETOX Purifying Mask inhibits the activity of the 5-alpha-reductase, enzyme responsible for sebum production. Diminishing the activity of this enzyme in this way is the most effective method to visibly reduce sebum production, without drying out skin. It also contains Perlite, a natural active substance of volcanic origin 5 times more absorbent than Kaolin. Particularly light and transparent, it has the capacity of efficiently absorbing sebum, while preserving a fresh, light and luminous complexion. Your skin is left cleaned and velvety soft with a shine free finish. Pores are less visible. Non drying. Warnings Always read the label and follow the directions for use. External use only. Common Uses Skin with imperfections, shine and dilated pores. Ingredients Water (Aqua), Perlite, Propanediol, Alcohol Denat., Hamamelis Virginiana (Witch Hazel) Water, Glycerin, Glyceryl Stearate, Cethyl Alcohol, Steareth-2, C12-15 Alkyl Benzoate, Kaolin, Pentaerythrityl Tetraisostearate, Jojoba Esters, Steareth-21, Mica, Epilobium Fleischeri Extract, Malva Sylvestris (Mallow) Flower Extract, Allantoin, Acer Saccharum (Sugar Maple) Extract, Citrus Aurantium Dulcis (Orange) Fruit Extract, Citrus Limon (Lemon) Fruit Extract, Saccharum Officinarum (Sugarcane) Extract, Vaccinium Myrtillus Fruit/Leaf Extract, Alcohol, C13-14 Isoparaffin, Chlorphenesin, Citric Acid, Ethylhexylglycerin, Laureth-7, PEG-100 Stearate, Polyacrylamide, Sodium Hydroxide, Tocopherol, Phenoxyethanol, Potassium Sorbate, Titanium Dioxide (CI 77891). Directions Once or twice a week, apply a thick layer on clean face. Leave on for 10 minutes. Rinse off with lukewarm water to perfectly eliminate impurities, then cold water to maximize astringent effect. Gently dry face. Continue with your SWISS SKIN SOLUTION beauty routine. In case of combination skin, apply the product on T-zone only.